CO 2 Laser Annealing NiTi Thin Films Deposited by Sputtering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5063, Issue , 2003, Pages 319-322

  He, Q ^a,b   Huang, W M ^b   Hong, M H ^a   Chong, T C ^a   Fu, Y Q ^b   Du, H J ^b  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Annealing; CO 2 Laser; NiTi; Shape Memory Alloy; Sputtering; Thin Film

Indexed keywords

CO2 LASER; LASER ANNEALING; NITI; SHAPE MEMORY;

ANNEALING; ATOMIC FORCE MICROSCOPY; AUSTENITE; CRYSTAL STRUCTURE; LASER BEAMS; MARTENSITE; MICROACTUATORS; NICKEL COMPOUNDS; OPTICAL MICROSCOPY; PIEZOELECTRIC MATERIALS; SHAPE MEMORY EFFECT; SPUTTERING; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

CARBON DIOXIDE LASERS;

EID: 2342467956     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.540464     Document Type: Conference Paper

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