Improved spray coating of photoresist for three-dimensional photolithography over deep structure

Digest of Papers - Microprocesses and Nanotechnology 2004

Volumn , Issue , 2004, Pages 306-307

  Singh, Vijay Kumar ^a   Sasaki, Minoru ^a   Watanabe, Yoshihiko ^b   Kawakita, Masato ^b   Hayashi, Hiroki ^b   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b USHIO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ASPECT RATIO; COATING TECHNIQUES; PHOTOLITHOGRAPHY; POTASSIUM COMPOUNDS; SPRAYING; THREE DIMENSIONAL;

CONCAVE CORNER; RECIPE PARAMETERS; RESIST THICKNESS; SPRAY COATING;

PHOTORESISTORS;

EID: 23244468336     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/imnc.2004.245665     Document Type: Conference Paper

References (6)

1. M. Sasaki, S. Nogawa and K. Hane: Trans. IEE Jpn. 122-E (2002) p.235 (in Japanese).
2. M. Sasaki, T. Ando, S. Nogawa and K. Hane: Jpn. J. Appl. Phys. 41 (2002) p.4350.
3. M. Sasaki, T. Yamaguchi, J.H. Song, K. Hane, M. Hara and K. Hori: J. Lightwav Technol. Vol.21 (2003) 602-608.
4. The commercial information about the developed spray coating system will be obtained from M. Kawakita (Tel: +81-45-901-2572,Email:m.kawakita@ushio.co.jp) .
5. V. K. Singh, M. Sasaki, J. H. Song, K. Hane, Digest of the 12th Int. Conf. on Solid-State Sensors, Actuators and Microsystems, 2E106.P, (2003) 817-820.
6. V. K. Singh, M. Sasaki, J. H. Song, K. Hane, Jpn. J. Appl. Phys. Part 1, No. 6B, Vol.42 (2003) 4027-4030.