Direct imprint in metal film stacks with low pressure and low temperature for optical elements applications

Digest of Papers - Microprocesses and Nanotechnology 2004

Volumn , Issue , 2004, Pages 138-139

  Cheng, H C ^a   Chuang, S Y ^b   Chen, H L ^c   Hung, Y L ^a   Ko, F H ^a  

^a NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELECTRON BEAMS; LOW TEMPERATURE EFFECTS; NANOTECHNOLOGY; OPTICAL DEVICES; OPTICAL MICROSCOPY; PLASTIC MOLDS; PRESSURE EFFECTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY;

GOLD FILM STACKS; HEATING TEMPERATURE; IMPRINT TEMPERATURE; METAL FILMS;

METALLIC FILMS;

EID: 23244457016     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/imnc.2004.245762     Document Type: Conference Paper

References (2)

1. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Science 272, 85 (1996).
2. H. Yoshihiko, U. Toshihiko, K. Tomohiro, and M. Takashi, SPIE-The International Society for Optical Engineering 74, 5220 (2003).