Process-kinetics in facing targets sputtering of multi-component oxide thin films

Thin Solid Films

Volumn 347, Issue 1-2, 1999, Pages 14-24

  Senthil Nathan, S ^a   Mohan Rao, G ^a   Mohan, S ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; COMPUTER SIMULATION; DEPOSITION; DIFFUSION; EMISSION SPECTROSCOPY; IONIZATION; LIGHT EMISSION; PLASMAS; REACTION KINETICS; SPUTTERING; SUBSTRATES; YTTRIUM BARIUM COPPER OXIDES;

ATOMIC FLUX RATIO; FACING TARGETS SPUTTERING; MULTICOMPONENT OXIDE THIN FILMS; OPTICAL EMISSION SPECTROSCOPY; PLASMA PARAMETERS; THERMALIZATION;

THIN FILMS;

EID: 0344339134     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01615-0     Document Type: Article

References (36)

1. Davis M.F., Wosik J., Forster K., et al. J. Appl. Phys. 69:1991;7182.
2. Greek J., Linker G., Meyer O. J. Supercond. 5:1992;345.
3. Lu Z., Truman J.K., Johansson M.E., Zhang D., Shih C.F., Liang G.C. Appl. Phys. Lett. 67:1995;712.
4. Berverich P., Utz B., Prusseit W., Kinder H. Physica C. 219:1991;497.
5. Hirata T., Naoe M. J. Appl. Phys. 67:1990;5047.
6. Terada N., Ihara H., Jo M., et al. Jpn. J. Appl. Phys. 27:1988;L639.
7. Senthil Nathan S. G.K. Muralidhar, G. Mohan Rao, S. Mohan, Thin Solid Films. 292:1997;20.
8. Pearse R.W.B., Gaydon A.G. The Identification of Molecular Spectra. 1964;Chapman and Hall, London.
9. Fleddermann C.B. J. Appl. Phys. 65:1989;2861.
10. Linde D.R. Handbook of Chemistry and Physics. 71st Ed. 1991;CRC Press, Boca Raton, FL.
11. Wu X.D., Dutta B., Hegde M.S., et al. Appl. Phys. Lett. 54:1989;179.
12. Klein J.D., Yen A. Appl. Phys. Lett. 55:1989;2670.
13. Xi X.X., Wu X.D., Inam A., et al. Appl. Phys. Lett. 57:1990;96.
14. Sakuta K., Iyori M., Katayama Y., Kobayashi T. Jpn. J. Appl. Phys. 29:1990;L611.
15. Ilyinsky L.S., Emmoth B., Hollmann E.K., Zaitsev A.G., Lavrentyev A.A. J. Phys. D: Appl. Phys. 28:1995;1.
16. Lin R.J. Appl. Phys. Lett. 56:1990;2451.
17. Li Q., Liu S., Fenner D.B., Luo J., Hamblen W.D., Haigis J. IEEE Trans. Appl. Supercond. 5:1995;1513.
18. Oya G., Diao C.C., Imai S., et al. J. Appl. Phys. 5809:1995;77.
19. Takagi T. Thin Solid Films. 92:1982;1.
20. Senthil Nathan S. G.K. Muralidhar, G. Mohan Rao, S. Mohan, Vacuum. 49:1998;221.
21. Thompson M.W. Philos. Mag. 18:1968;377.
22. Somekh R.E. Vacuum. 987:1984;34.
23. Motohiro T. Taga. Surf. Sci. Lett. 134:1983;L494.
24. Stache J. J. Vac. Sci. Technol. A. 12:1994;2867.
25. Eisenmenger-Sittner C., Beyer R. Knecht. A. Bergauer, W. Bauer, G. Betz, J. Vac. Sci. Technol. A. 13:1995;2435.
26. Bogaerts A., Straaten M.K., Gijbels R. J. Appl. Phys. 77:1995;1868.
27. Senthil Nathan S. G. Mohan Rao, S. Mohan, J. Appl. Phys. 84:1998;584.
28. Sigmund P. Topics on Applied Physics. Behrisch R. Sputtering by Particle bombardment. 47:1983;Springer-Verlag, New York.
29. Abrahamson A.A. Phys. Rev. 178:1969;76.
30. Senthil Nathan S. G.K. Muralidhar, G. Mohan Rao, S. Mohan, Vacuum. 48:1997;113.
31. R.H. Hammond, V. Maltijasevic, R. Bormann, et al., in: Proc. 3rd Workshop on High Temperature, Superconducting Electron Devices, may 15-17, 1991, Kumamoto, Kyushu, Japan.
32. Oya G., Diao C.C., Imai S., et al. J. Appl. Phys. 77:1995;5809.
33. Jorgenson J.D., Veal B.W., Paulikas A.P., Crabtree G.W., Claus H., Kwok W.K. Phys. Rev. B. 41:1990;1863.
34. Sinha R.K., Sinha R.K., Srivastava S.K. Supercond. Sci. Technol. 7:1994;52.
35. Sinha R.K., Sinha R.K., Srivastava S.K. Supercond. Sci. Technol. 6:1993;238.
36. Bhudani R.C., Ruckman M.W. Appl. Phys. Lett. 55:1989;2354.