Fabrication of multiply-stacked structures of Si quantum-dots embedded in SiO2 by combination of low-pressure CVD and remote plasma treatments

Digest of Papers - Microprocesses and Nanotechnology 2004

Volumn , Issue , 2004, Pages 216-217

  Makihara, Katsunori ^a   Nakagawa, Hiroshi ^a   Ikeda, Mitsuhisa ^a   Murakami, Hideki ^a   Higashi, Seiichiro ^a   Miyazaki, Seiichi ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; OXIDATION; PLASMA APPLICATIONS; SEMICONDUCTING SILICON; SILICA; SURFACE TREATMENT; ULTRATHIN FILMS;

FLOATING GATES; MULTIPLY-STACKED STRUCTURES; REMOTE PLASMA TREATMENT; SURFACE OXIDATION;

SEMICONDUCTOR QUANTUM DOTS;

EID: 23244443779     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. A. Kohno, H. Murakami, M. Ikeda, S. Miyazaki and M. Hirose, Jpn. J. Appl. Phys. 40 (2001) 721.
2. S. Miyazaki, Y. Hamamoto, E. Yoshida, M. Ikeda and M. Hirose, Thin Solid Films 369 (2000) 55.
3. S. Miyazaki, M. Ikeda, E. Yoshida, N. Shimizu and M. Hirose, Proc. of 25th Int. Conf. on. Phys. of Semicond., (Osaka, 2000) p.373.
4. R. R. Irani and C. F. Callis in Particle Size Measurement: Interpretation and Application, (Wiley, New York, 1963).