Large grain polycrystalline silicon film produced by nano-aluminum-enhanced crystallization of amorphous silicon

Electrochemical and Solid-State Letters

Volumn 8, Issue 7, 2005, Pages

  Cai, Li ^a   Wang, Hengyu ^a   Brown, William ^a   Zou, Min ^a  

^a University of Arkansas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; FILM GROWTH; GRAIN GROWTH; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; TEMPERATURE MEASUREMENT; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CRYSTALLIZATION TEMPERATURES; RADIO FREQUENCY (RF) POWER; SILICON FILMS; SILICON GRAIN;

POLYSILICON;

EID: 23244436563     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1928232     Document Type: Article

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