Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique

Journal of Magnetism and Magnetic Materials

Volumn 272-276, Issue SUPPL. 1, 2004, Pages

  Han, G C ^a   Wu, Y H ^a,b   Tay, M ^a   Guo, Z B ^a   Li, K B ^a   Chong, C T ^a  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Magnetic semiconductor; Sputtering; Thin film; TiO2: Co

Indexed keywords

COBALT; EPITAXIAL GROWTH; FILM GROWTH; MAGNETISM; PARAMETER ESTIMATION; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM DIOXIDE;

MAGNETIC SEMICONDUCTOR; PRE-CLEANING CHAMBERS; REVERSE SPUTTERING; SATURATION MOMENT;

THIN FILMS;

EID: 23144463899     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2003.12.799     Document Type: Conference Paper

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