Self-assembled monolayers of a thiol-derivatized porphyrin on gold electrode: Film formation and electrocatalytic dioxygen reaction

Thin Solid Films

Volumn 488, Issue 1-2, 2005, Pages 230-235

  Lu, Xiaoquan ^a   Lv, Baoqiang ^a   Xue, Zhonghua ^a   Li, Minrui ^a   Zhang, Limin ^a   Kang, Jingwan ^a  

^a NORTHWEST NORMAL UNIVERSITY   (China)

Author keywords

Atomic for microscopy; Electrochatalysis; Thiol derivatized porphyrin; Voltametry

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSTS; DEPOSITION; ELECTRODES; GRAPHITE; MONOLAYERS; OXIDATION; PORPHYRINS; PYROLYSIS; VOLTMETERS;

ELECTROCATALYTIC; FILM FORMATION; GOLD ELECTRODS; THIOL-DERIVATIZED PORPHYRIN PORPHYRIN;

GOLD;

EID: 23044477487     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.04.116     Document Type: Article

References (27)

1. E. Song, C. Shi, and F.C. Anson Langmuir 14 1998 4315
2. H. Imahori, H. Norieda, S. Ozawa, K. Ushida, H. Yamada, T. Azuma, K. Tamaki, and Y. Sakata Langmuir 14 1998 5335
3. H. Imahori, T. Hasobe, H. Yamada, Y. Nishimura, I. Yamazaki, and S. Fukuzumi Langmuir 17 2001 4925
4. D.A. Offord, S.B. Sachs, M.S. Ennis, T.A. Emberspacher, J.H. Griffin, C.E. Chidsey, and J.P. Collman J. Am. Chem. Soc. 120 1998 4478
5. C. Shi, and F.C. Anson Inorg. Chem. 31 1992 5078
6. Y.K. Choi, S. Jeon, J.K. Park, and K.H. Chjo Electrochim. Acta 42 1997 1287
7. M. Biesaga, K. Pyrzynska, and M. Trojanowics Talanta 51 2000 209
8. D.T. Chung, and F.C. Anson J. Electroanal. Chem. 115 2001 508
9. F. Malem, and D. Mandler Anal. Chem. 37 1993 65
10. Y. Xiao, H.X. Ju, and H.Y. Chen Anal. Chim. Acta 73 1999 391
11. C.E. Chidsey, and D.N. Loiacono Langmuir 6 1990 682
12. V. Huc, F. Armand, J.P. Bourgoin, and S. Palacin Langmuir 17 2001 1928
13. J.E. Hutchison, T.A. Postlethwaite, and R.W. Murray Langmuir 9 1992 3277
14. T.A. Postlethwaite, J.E. Hutchiso, K.W. Hatchcock, and R.W. Murray Langmuir 11 1995 4109
15. E. Song, C.N. Shi, and F.C. Anson Langmuir 14 1998 4315
16. X.Q. Lu, B.Q. Lv, Zh.H. Xue, M. Zhang, Y.Sh. Wang, and J.W. Kang Anal. Lett. 35 2002 1811
17. H. Shen, J.E. Mark, C.J. Seliskar, H.B. M. Jr., and W.R. Heineman J. Solid State Electrochem. 1 1997 148
18. N. Nishimura, M. Ooi, K. Shimazu, H. Fujii, and K. Uosaki J. Electroanal. Chem. 75 1999 473
19. L.X. Wen, R.Ch. Wu, and E. Eschenazi Colloids Surf., A Physicochem. Eng. Asp. 157 2002 197
20. I. Ooudevskl, and D.K. Schwartz Langmuir 16 2000 9381
21. T. Fukuda, Y. Maeda, and H. Kitano Langmuir 15 1999 1887
22. G. Wittstock, and W. Schuhmann Anal. Chem. 69 1997 5059
23. M.M. Walczak, D.D. Popenoe, R.S. Deinhammer, B.D. Lamp, C. Chung, and M.D. Porter Langmuir 7 1991 2687
24. S.I. Imabayashi, D. Hobara, and T. Kakiuchi Langmuir 17 2001 2560
25. N. Kanayama, T. Kanbara, and H. Kitano J. Phys. Chem., B 104 2000 271
26. S. Bollo, C. Yáñez, J. Sturm, L. Núñez-Vergara, and J.A. Squella Langmuir 19 2003 3365
27. H. Imahori, H. Norieda, S. Ozawa, K. Ushida, H. Yamada, T. Azuma, K. Tamaki, and Y. Sakata Langmuir 14 1998 5335