Novel fabrication technique for 0.1 μm T-shaped gate with i-line negative resist and poly(methylmethacrylate)

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 2, 1999, Pages 320-322

  Anda, Yoshiharu ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644451234     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590558     Document Type: Article

References (5)

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3. M M. Ahmed and H. Ahmed, J. Vac. Sci. Technol. B 15, 306 (1997).
4. H. Takenaka, H. Watanabe, Y. Todokoro, and M. Inoue, Proceedings of the 1990 International Micro Process Conference, 1990, p. 39.
5. N. Samoto, I. Miura, Y. Makino, and K. Yamanoguchi, J. Vac. Sci. Technol. B 12, 3673 (1994).