Room-temperature radio frequency sputtered Ta2O5: A new etch mask for bulk silicon dissolved processes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 2, 1999, Pages 455-459

  Chu, A K ^a   Huang, Y S ^a   Tang, S H ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644450633     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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