Silicon clusters in silicon monoxide films

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 3, 2005, Pages 1383-1387

  Szekeres, A ^a   Nikolova, T ^a   Paneva, A ^c   Cziraki, A ^d   Kovacs, Gy ^b   Lisovskyy, I ^e   Mazunov, D ^e   Indutnyy, I ^e   Shepeliavyi, P ^e  

^a Institute OJSolid State Physics   (Bulgaria)

^b UNIVERSITY OF SOFIA   (Bulgaria)

^c EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^d RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^e Institute of Semiconductor Physics   (Ukraine)

Author keywords

Nanocrystalline Si clusters; Silicon monoxide; Spectral ellipsometry; Transmission electron microscopy; X ray diffractometry

Indexed keywords

AMORPHOUS SILICON; ANNEALING; ELLIPSOMETRY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOCLUSTERS; NANOCRYSTALLINE SILICON; NANOCRYSTALLITES; NANOCRYSTALS; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

ELLIPSOMETRIC MEASUREMENTS; NANOCRYSTALLINE SI; RANDOMLY DISTRIBUTED; SI NANO-CRYSTALLITES; SILICON MONOXIDE; SPECTRAL ELLIPSOMETRY; THICKNESS OF THE FILM; X-RAY SCATTERING MEASUREMENTS;

SILICON COMPOUNDS;

EID: 22644440860     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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