On the effect of the substrate pretreatment parameters on the composition and structure of plasma deposited SiO2 thin films

Journal of Physics: Conference Series

Volumn 10, Issue 1, 2005, Pages 206-209

  Voulgaris, Ch ^a   Amanatides, E ^a   Mataras, D ^a   Rapakoulias, D E ^a  

^a UNIVERSITY OF PATRAS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22544447395     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/10/1/051     Document Type: Article

References (8)

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5. Schreiber H P, Wertheimer M R, Wrobel A M 1980 Thin Solid Films 72 487
6. Spiliopoulos N, Mataras D and Rapakoulias D E 1996 J. Vac. Sci. Technol. A 14 2757
7. Voulgaris C, Panou A, Amanatides E and Mataras D Surf. Coat. Technol. submitted
8. Valle C, Goullet A, Nicolazo F, Granier A and Turban G 1997 J. Non-Crystalline Solids 216 48