Silicon containing organic-inorganic hybrid materials as EUV photoresists

Journal of Photopolymer Science and Technology

Volumn 18, Issue 4, 2005, Pages 481-487

  Kwark, Young Je ^a   Pablo Bravo Vasquez, J ^b   Cao, Heidi B ^c   Deng, Hai ^c   Ober, Christopher K ^b  

^a Soongsil University   (South Korea)

^b School of Operations Research and Industrial Engineering   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

EUV lithography; Hybrid materials; Polysilanes; Silicon containing polymer; Silsesquiazanes

Indexed keywords

EID: 22144493832     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.481     Document Type: Article

References (11)

1. ITRS Technology Roadmap, 2003.
2. www.cxro.lbl.gov/optical_constants/filter2
3. Y.-J. Kwark, J. P. Bravo-Vasquez, C. K. Ober, H. B. Cao, and R. P. Meagley, Proc. SPIE, 5039 (2003) 1204.
4. J. Lücke, J. Hacker, D. Suttor, and G. Ziegler, Appl. Organometal Chem. 11 (1997) 181.
5. T. Hanemann, M. Ade, M. Börner, G. Motz, M. Schulz, and J. Haußelt, Adv. Eng. Mater. 4 (2002) 869.
6. T. Kikkawa, T. Nagahara, and H. Matsuo, Appl. Phys. Lett. 78 (2001) 2551.
7. R. West, J. Organomet. Chem. 300 (1986) 327.
8. M. Birot, J.-P. Pilot, and J. Dunogues, Chem. Rev. 95 (1995) 1443.
9. J. P. Bravo-Vasquez, Y.-J. Kwark, C. K. Ober, H. B. Cao, H. Deng, and R. P. Meagley, Proc. SPIE, 5376 (2004) 739.
10. R.D. Miller and J. Michl, Chem. Rev. 89 (1989) 1359.
11. T. Ogawa, A. Yamagushi, H. Yamanasha, M. Ito, H. Tachibana, M. Matsumoto, T. Sekitani, T. Tanaka, Jap. J. Applied Phys. Part 1, 12B (1996) 6487