Nanopatterning of vapor-deposited aminosilane film using EB lithography for ferritin protein adsorption

Journal of Photopolymer Science and Technology

Volumn 18, Issue 4, 2005, Pages 495-500

  Kumagai, Shinya ^a   Yoshii, Shigeo ^a   Yamada, Kiyohito ^a   Fujiwara, Isamu ^b   Matsukawa, Nozomu ^a   Yamashita, Ichiro ^a,b  

^a PANASONIC CORPORATION   (Japan)

^b NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Aminosilane; Debye length; EB lithography; Ferritin protein; Surface modification

Indexed keywords

EID: 22144461063     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.18.495     Document Type: Article

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