Effect of the silicon top layer of silicon implanted with oxygen on the uptake and release of deuterium by the buried oxide

Applied Physics Letters

Volumn 73, Issue 6, 1998, Pages 774-776

  Zimmermann, L ^a   De Nijs, J M M ^a   Alkemade, P F A ^a   Westerduin, K ^b   Van Veen, A ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21944447272     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121997     Document Type: Article

References (8)

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