In Situ Pulsed Laser-Induced Thermal Desorption Studies of the Silicon Chloride Surface Layer During Silicon Etching in High Density Plasmas of Cl2 and Cl2/O2 Mixtures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 12, Issue 5, 1994, Pages 2630-2640

  Herman, I P ^b   Guinn, K V ^a   Donnelly, V M ^a  

^a LUCENT TECHNOLOGIES   (United States)

^b Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21844515373     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579082     Document Type: Article

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