BASIC PRINCIPLES OF PLASMA ETCHING FOR SILICON DEVICES.

VLSI Electronics, Microstructure Science

Volumn 8, Issue , 1984, Pages 189-251

  Flamm, Daniel L ^a   Donnelly, Vincent M ^a   Ibbotson, Dale E ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA DEVICES - APPLICATIONS; SEMICONDUCTING SILICON - ETCHING;

FLUOROCARBON F-ATOM SOURCES; INORGANIC F-ATOM SOURCES; ION-ENHANCED PLASMA ETCHING; ISOTROPIC AND ANISOTROPIC ETCHING; SILICON DEVICES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0021568678     PISSN: None     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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