The role of wetting on the water flux performance of microsieve membranes

Journal of Membrane Science

Volumn 259, Issue 1-2, 2005, Pages 55-64

  Gironès, Míriam ^a   Borneman, Zandrie ^a   Lammertink, Rob G H ^a   Wessling, Matthias ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Flux decline; Microsieves; Silicon nitride; Surface properties; Wetting

Indexed keywords

HYDROPHOBICITY; MAGNETIC FLUX; MAGNETIC PERMEABILITY; POROSITY; SILICON NITRIDE; SUBSTRATES; SURFACE PROPERTIES; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROPHOBIZED MEMBRANES; MICROSIEVE MEMBRANES; WATER FLUX; WATER PERMEATION;

MEMBRANES;

SILICON NITRIDE; WETTING AGENT;

MEMBRANE; MOLECULAR SIEVE; WETTING;

ARTICLE; FILTRATION; HYDRODYNAMICS; HYDROPHILICITY; HYDROPHOBICITY; MEMBRANE TRANSPORT; PARTICLE SIZE; POROSITY; PRESSURE; PRIORITY JOURNAL; SURFACE PROPERTY; WATER FLOW;

EID: 21844478753     PISSN: 03767388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.memsci.2005.03.006     Document Type: Article

References (18)

1. S. Kuiper, C.J.M. Van Rijn, W. Nijdam, and M.C. Elwenspoek Development and applications of very high flux microfiltration membranes J. Membr. Sci. 150 1998 1
2. C.J.M. Van Rijn, and M.C. Elwenspoek Microfiltration membrane sieve with silicon micromachining for industrial and biomedical applications IEEE Proceedings MEMS, Amsterdam 1995
3. M. Madou Fundamentals of Microfabrication 1997 CRC Press New York
4. M. Schwartz Handbook of Structural Ceramics 1992 McGraw-Hill New York
5. A. Hozumi, K. Ushiyama, H. Sugimura, and O. Takai Fluoroalkylsilane monolayers formed by chemical vapor surface modification on hydroxylated oxide surfaces Langmuir 15 1999 7600
6. A.C.M. Franken, J.A.M. Nolten, M.H.V. Mulder, D. Bargeman, and C.A. Smolders Wetting criteria for the applicability of membrane distillation J. Membr. Sci. 33 1987 315
7. 2 from dilute gas streams using membrane contactors Chem. Eng. Sci. 57 2002 1639
8. L.T. Canham, M.R. Houlton, W.Y. Leong, C. Pickering, and J.M. Keen Atmospheric impregnation of porous silicon at room temperature J. Appl. Phys. 70 1991 422
9. F. Lukes Oxidation of Si and GaAs in air at room temperature Surf. Sci. 30 1972 91
10. S.I. Raider, R. Flitsch, and M.J. Palmer Oxide growth on etched silicon in air at room temperature J. Electrochem. Soc. 122 1975 413
11. L.J. Bousse, S. Mostarshed, and D. Hafeman Combined measurement of surface potential and zeta potential at insulator/electrolyte interfaces Sens. Actuators B: Chem. 10 1992 67
12. M.N. Rahaman, Y. Boiteux, and L.C. De Jonghe Surface characterization of silicon nitride and silicon carbide powders Am. Ceram. Soc. Bull. 65 1986 1171
13. D. Leonard, Y. Chevolot, O. Bucher, H. Sigrist, and H.J. Mathieu TOF-SIMS and XPS study of photoactivatable reagents designed for surface glycoengineering Surf. Interface Anal. 26 1998 783
14. T. Mikolajick, R. Kuhnhold, R. Schnupp, and H. Ryssel The influence of surface oxidation on the pH-sensing properties of silicon nitride Sens. Actuators B: Chem. 58 1999 450
15. B. Pignataro, G. Grasso, L. Renna, and G. Marletta Adhesion properties on nanometric scale of silicon oxide and silicon nitride surfaces modified by 1-octadecene Surf. Interface Anal. 33 2002 54
16. J. Szepvolgyi, I. Mohai, and J. Gubicza Atmospheric ageing of nanosized silicon nitride powders J. Mater. Chem. 11 2001 859
17. S.T. Patton, K.C. Eapen, and J.S. Zabinski Effects of adsorbed water and sample aging in air on the [mu]N level adhesion force between Si(100) and silicon nitride Tribol. Int. 34 2001 481
18. 2 plasma surface treatment for pH-ISFET applications IEEE Trans. Biomed. Eng. 48 2001 340