메뉴 건너뛰기




Volumn , Issue , 2004, Pages 399-402

Modeling of retention time distribution of DRAM cell using a Monte-Carlo method

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON TRAPS; ELECTRON TUNNELING; ENERGY GAP; GREEN'S FUNCTION; INTERFACES (MATERIALS); LEAKAGE CURRENTS; MATHEMATICAL MODELS; MONTE CARLO METHODS; SPURIOUS SIGNAL NOISE; STATISTICAL METHODS; INTELLIGENT SYSTEMS; STRESSES;

EID: 21644471405     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (13)

References (7)
  • 1
    • 21644472038 scopus 로고    scopus 로고
    • A Monte-Carlo method for distribution of standby currents and its application to DRAM retention time
    • Munich
    • S. Jin, J.-H. Yi, Y. J. Park, and H. S. Min, "A Monte-Carlo method for distribution of standby currents and its application to DRAM retention time," Proc. SISPAD, Munich, 2004, pp. 315-318.
    • (2004) Proc. SISPAD , pp. 315-318
    • Jin, S.1    Yi, J.-H.2    Park, Y.J.3    Min, H.S.4
  • 3
    • 0026819795 scopus 로고
    • A new recombination model for device simulation including tunneling
    • February
    • G. A. M. Hurkx, D. B. M. Klaassen, and M. P. G. Knuvers, "A new recombination model for device simulation including tunneling," IEEE Trans. Electron Dev., vol. 39, pp. 331-338, February 1992.
    • (1992) IEEE Trans. Electron Dev. , vol.39 , pp. 331-338
    • Hurkx, G.A.M.1    Klaassen, D.B.M.2    Knuvers, M.P.G.3
  • 4
    • 0000052811 scopus 로고
    • Effect of mechanical stress on p-n junction device characteristics
    • July
    • J. J. Wortman, J. R. Hauser, and R. M. Burger, "Effect of mechanical stress on p-n junction device characteristics," J. Appl. Phys., vol. 35, pp. 2122-2131, July 1964.
    • (1964) J. Appl. Phys. , vol.35 , pp. 2122-2131
    • Wortman, J.J.1    Hauser, J.R.2    Burger, R.M.3
  • 5
    • 0032635962 scopus 로고    scopus 로고
    • Influence of process-induced stress on device characteristics and its impact on scaled device performance
    • June
    • P. Smeys, P. B. Griffin, Z. U. Rek, I. D. Wolf, and K. C. Saraswat, "Influence of process-induced stress on device characteristics and its impact on scaled device performance," IEEE Trans. Electron Dev., vol. 46, pp. 1245-1252, June 1999.
    • (1999) IEEE Trans. Electron Dev. , vol.46 , pp. 1245-1252
    • Smeys, P.1    Griffin, P.B.2    Rek, Z.U.3    Wolf, I.D.4    Saraswat, K.C.5
  • 6
    • 0032284229 scopus 로고    scopus 로고
    • Local-field-enhancement model of DRAM retention failure
    • San Francisco
    • A. Hiraiwa, M. Ogasawara, N. Natsuaki, Y. Itoh, and H. Iwai, "Local-field-enhancement model of DRAM retention failure," IEDM Tech. Dig., San Francisco, 1998, pp. 157-160.
    • (1998) IEDM Tech. Dig. , pp. 157-160
    • Hiraiwa, A.1    Ogasawara, M.2    Natsuaki, N.3    Itoh, Y.4    Iwai, H.5
  • 7
    • 0032099759 scopus 로고    scopus 로고
    • On the retention time distribution of dynamic random access memory (DRAM)
    • June
    • T. Hamamoto, S. Sugiura, and S. Sawada, "On the retention time distribution of dynamic random access memory (DRAM)," IEEE Trans. Electron Dev., vol. 45, pp. 1300-1309, June 1998.
    • (1998) IEEE Trans. Electron Dev. , vol.45 , pp. 1300-1309
    • Hamamoto, T.1    Sugiura, S.2    Sawada, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.