SCREAM'03: A single mask process for high-Q single crystal silicon MEMS

American Society of Mechanical Engineers, Micro-Electro Mechanical Systems Division, (Publications) MEMS

Volumn , Issue , 2004, Pages 211-215

  Zhang, Wenhua ^a   Zhang, Weibin ^a   Turner, Kimberly ^a   Hartwell, Peter G ^b  

^a University of California   (United States)

^b HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTROMECHANICAL DEVICES; MICROMACHINING; OSCILLATORS (MECHANICAL); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; SILICON; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SINGLE CRYSTALS;

BULK MICROMACHINING; LASER VIBROMETERS; SCREAM; SINGLE-CRYSTAL SILICON;

MASKS;

EID: 21644457201     PISSN: 1096665X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/IMECE2004-61140     Document Type: Conference Paper

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