Plasma and ion beam process-induced damage in semiconductors: Review and retrospective

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

Volumn 1, Issue , 2004, Pages 532-537

  Ashok, S ^a  

^a The Pennsylvania State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM PLASMA INTERACTIONS; ELECTRIC INSULATORS; ELECTRIC POTENTIAL; GALLIUM COMPOUNDS; ION BEAMS; SILICON;

FOCUSED ION BEAMS (FIB); ION-BEAM PROCESSING; PLASMA IMMERSION IMPLANTATION (PII); PROCESS-INDUCED DAMAFES;

SEMICONDUCTOR MATERIALS;

EID: 21644453049     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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