Fabrication and properties study of harmonic beam splitter at 1064 nm

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 32, Issue 6, 2005, Pages 835-838

  Ma, Xiao Feng ^a,b   Zhang, Dong Ping ^a,b   Wang, Ying Jian ^a   Fan, Shu Hai ^a,b   Gao, Wei Dong ^a,b   Fan, Zheng Xiu ^a   Shao, Jian Da ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Harmonic beam splitter; Laser induced damage threshold; Thin films; Weak absorption

Indexed keywords

ANNEALING; FILM PREPARATION; LASER DAMAGE; OPTICAL FILMS; OPTICAL PROPERTIES; SPECTROPHOTOMETERS; THIN FILMS;

ELECTRON BEAM EVAPORATION; HARMONIC BEAM SPLITTERS; LASER INDUCED DAMAGE THRESHOLD (LIDT); PHOTOELECTRIC MAXIMUM CONTROL METHOD; SURFACE THERMAL LENSING TECHNIQUE (STL);

OPTICAL BEAM SPLITTERS;

EID: 21544452289     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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