Formation of NiO-SiO2 nanocomposite thin films by the sol-gel method

Journal of Non-Crystalline Solids

Volumn 351, Issue 24-26, 2005, Pages 2029-2035

  Hernandez Torres J ^a   Mendoza Galvan A ^a  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITE MATERIALS; NANOSTRUCTURED MATERIALS; NICKEL COMPOUNDS; PARTICLE SIZE ANALYSIS; POROUS MATERIALS; SILICA; SOL-GELS; TEMPERATURE DISTRIBUTION; THERMOGRAVIMETRIC ANALYSIS; VOLUME FRACTION; X RAY DIFFRACTION;

COMPOSITE LAYERS; NANOCOMPOSITES; OPTIMAL VALUES; POROUS STRUCTURE;

THIN FILMS;

EID: 21444458178     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.05.011     Document Type: Article

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