Elution study of unreacted Bis-GMA, TEGDMA, UDMA, and Bis-EMA from light-cured dental resins and resin composites using HPLC

Journal of Biomedical Materials Research - Part B Applied Biomaterials

Volumn 74, Issue 1, 2005, Pages 617-626

  Sideridou, Irini D ^a   Achilias, Dimitris S ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

Dental resins; Elution; HPLC; Residual monomers; Resin composites

Indexed keywords

BIOMATERIALS; COPOLYMERS; GLYCOLS; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; MONOMERS; RESINS;

ELUTION PROCESSES; IMMERSION PERIODS; LIGHT-CURING; WATER SOLUTIONS;

COMPOSITE MATERIALS;

ALCOHOL; BISPHENOL A BIS(2 HYDROXYPROPYL) ETHER DIMETHACRYLATE; COPOLYMER; ETHOXYLATED BISPHENOL A GLYCOL DIMETHACRYLATE; FILLER; METHACRYLIC ACID DERIVATIVE; MONOMER; RESIN; TRIETHYLENE GLYCOL; TRIETHYLENE GLYCOL DIMETHACRYLATE; UNCLASSIFIED DRUG; URETHAN DERIVATIVE; URETHANE DIMETHACRYLATE; WATER;

ARTICLE; CHEMICAL STRUCTURE; CONCENTRATION (PARAMETERS); ELUTION; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; MATERIALS; PHYSICAL CHEMISTRY;

BIOCOMPATIBLE MATERIALS; BISPHENOL A-GLYCIDYL METHACRYLATE; CHROMATOGRAPHY, HIGH PRESSURE LIQUID; COMPOSITE RESINS; DENTAL MATERIALS; DENTAL RESTORATION, PERMANENT; LIGHT; MATERIALS TESTING; METHACRYLATES; POLYETHYLENE GLYCOLS; POLYMERS; POLYMETHACRYLIC ACIDS; POLYURETHANES; SOLVENTS; TIME FACTORS;

EID: 21444432134     PISSN: 00219304     EISSN: None     Source Type: Journal    
DOI: 10.1002/jbm.b.30252     Document Type: Article

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