Low-Temperature Growth of Nanocrystalline Diamond by Reactive Pulsed Laser Deposition under a Hydrogen Atmosphere

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 2 B, 2004, Pages

  Yoshitake, Tsuyoshi ^a   Hara, Takeshi ^a   Fukugawa, Tomohito ^a   Zhu, Ling Yun ^a   Itakura, Masaru ^a   Kuwano, Noriyuki ^a   Tomokiyo, Yoshitsugu ^a   Nagayama, Kunihito ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Ablation; Diamond; NCD; PLD; TEM

Indexed keywords

AMORPHOUS MATERIALS; CARBON; ELECTRON DIFFRACTION; HYDROGEN; NANOSTRUCTURED MATERIALS; PULSED LASER DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

FILM THICKNESS; FLOW RATE; FULL WIDTH AT HALF MAXIMUM (FWHM); NCD;

DIAMONDS;

EID: 2142824282     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.43.l240     Document Type: Article

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