Confirmation of Large-Periphery Compressible Gas Flow Model for Microvalves

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5344, Issue , 2004, Pages 155-162

  Henning, Albert K ^a  

^a Redwood Microsystems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIBILITY OF GASES; COMPRESSIBLE FLOW; FINITE ELEMENT METHOD; FLOW CONTROL; MATHEMATICAL MODELS; ORIFICES; VALVES (MECHANICAL);

COMPRESSIBLE GAS FLOW MODELS; FLOW BOUNDARY CONDITIONS; MICROVALVES;

MICROELECTROMECHANICAL DEVICES;

EID: 2142812581     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.532665     Document Type: Conference Paper

References (18)

1. A. Vladimirescu and S. Liu, "The simulation of MOS integrated circuits using SPICE2." ERL Memo No. ERL M80/7, Electronics Research Laboratory, University of California, Berkeley, CA, October, 1980.
2. M. Carmona, S. Marco, J. Samitier, M. C. Acero, J. A. Plaza, and J. Esteve, "Microvalve analysis: wall shear and diffuser effects." In Proceedings, International Conference on Modeling and Simulation of Microsystems (MSM99), pp. 554-557 (Computational Publications, Boston, 1999).
3. J. K. Robertson, "An electrostatically-actuated integrated microflow controller." Ph.D. dissertation, pp. 39ff (U. Michigan, Ann Arbor, MI, 1996).
4. R. Qiao and N. R. Aluru, "A compact flow model for flowrate and pressure computation in micro-fluidic devices." In Proceedings, Modeling and Simulation of Microsystems 2002 (Computational Publications, Cambridge, MA, 2002), pp. 58-61.
5. M.G. Giridharan, P. Stout, H.Q. Yang, M. Athavale, P. Dionne, and A. Przekwas, "Multidisciplinary CAD system for MEMS." J. Model. Sim. Microsyst. 2(1), pp. 43-50 (2001).
6. F. Yang and I. Kao, "Analysis of pressure-balanced MEMS valves." In Proceedings, International Conference on Modeling and Simulation of Microsystems (MSM98), pp. 534-539 (Computational Publications, Boston, 1998).
7. A. K. Henning, J. S. Fitch, J. M. Harris, E. B. Dehan, B. A. Cozad, L. Christel, Y. Fathi, D. A. Hopkins, Jr., L. J. Lilly, W. McCulley, W. A. Weber, and M. Zdeblick, "Microfluidic MEMS for semiconductor processing." IEEE Transactions on Components, Packaging, and Manufacturing Technology B21, pp. 329-337 (1998).
8. A. K. Henning, "A compact, pressure- and structure-based gas flow model for microvalves." In Proceedings, Materials and Device Characterization in Micromachining (SPIE, Bellingham, WA, 2000; Y. Vladimirsky and P. J. Coane, eds.), volume 4175, pp. 74-81.
9. W. van der Wijngaart, "A study of orifice-controlled flow for microvalve design optimization." (In Designing Microfluidic Control Components, PhD Dissertation, Paper #8, Royal Institute of Technology, Stockholm, Sweden, 2002).
10. A. K. Henning, "Improved gas flow model for microvalves." In Proceedings, Transducers '03, pp. 1550-1553 (IEEE, Piscataway, NJ, 2003).
11. A. K. Henning, "Comprehensive compressible gas flow model for microvalves." Submitted for publication.
12. H. Takao, M. Ishida, and K. Sawada, "A pneumatically actuated full in-channel microvalve with MOSFET-like function in fluid channel networks." J. Microelectromech. Syst. 11(5), pp. 421-426 (2002).
13. Mario DiGiovanni, Flat and Corrugated Diaphragm Design Handbook. (Marcel Dekker, New York, NY, 1982).
14. nd ed.). pp. 511-582, and pp. 287-371 (McGraw-Hill, New York, 1986).
15. J. C. Kayser and R. L. Shambaugh, "Discharge coefficient for compressible flow through small-diameter orifices and convergent nozzles." Chem. Engg. Sci. 46(7), pp. 1697-1711 (1991).
16. S. F. Borisov, I. G. Neudachin, B. T. Porodnov, and P. E. Suretin, "Flow of rarefied gas through an orifice at small pressure differentials," Sov. Phys. Tech. Phys. 18(8), pp. 1092-1094 (1974).
17. D. G. Friend, "NIST Thermophysical Properties of Pure Fluids, Version 3.0." U.S. Department of Commerce, National Institute of Standards and Technology, Gaithersburg, MD (1992). Also, J. Hurly and K. Gillis, "Database of the Thermophysical Properties of Gases Used in the Semiconductor Industry." URL http://properties.nist.gov/SemiProp/, modified 26 August 2003.
18. D. G. Friend, "NIST Thermophysical Properties of Pure Fluids, Version 3.0." U.S. Department of Commerce, National Institute of Standards and Technology, Gaithersburg, MD (1992). Also, J. Hurly and K. Gillis, "Database of the Thermophysical Properties of Gases Used in the Semiconductor Industry." URL http://properties.nist.gov/SemiProp/, modified 26 August 2003.