Characterization of tellurium-based films for NO2 detection

Thin Solid Films

Volumn 485, Issue 1-2, 2005, Pages 252-256

  Tsiulyanu, D ^a   Tsiulyanu, A ^a   Liess, H D ^b   Eisele, I ^b  

^a TECHNICAL UNIVERSITY OF MOLDOVA   (Moldova)

^b BUNDESWEHR UNIVERSITY MUNICH   (Germany)

Author keywords

Gas sensors; Nitrogen dioxide; Tellurium

Indexed keywords

ACTIVATION ENERGY; CHEMICAL SENSORS; ELECTRIC CONDUCTIVITY; EVAPORATION; HEAT TREATMENT; NITROGEN OXIDES; SCANNING ELECTRON MICROSCOPY; TELLURIUM;

CHALCOGEN ATOMS; NITROGEN DIOXIDES; OPERATING TEMPERATURES; SENSOR DEVICES;

THIN FILMS;

EID: 21244502069     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.03.045     Document Type: Article

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