Comparison of an self-organizing migration algorithm with simulated annealing and differential evolution for automated waveform tuning

Advances in Engineering Software

Volumn 36, Issue 10, 2005, Pages 645-653

  Nolle, L ^a   Zelinka, I ^b   Hopgood, A A ^a   Goodyear, A ^c  

^a NOTTINGHAM TRENT UNIVERSITY   (United Kingdom)

^b TOMAS BATA UNIVERSITY IN ZLIN   (Czech Republic)

^c OPEN UNIVERSITY   (United Kingdom)

Author keywords

Active compensation; Differential evolution; Langmuir probes; Optimization; RF plasma; Self organising migration algorithm; Simulated annealing

Indexed keywords

AUTOMATION; ETCHING; HARMONIC ANALYSIS; OPTIMIZATION; PLASMA DIAGNOSTICS; RANDOM PROCESSES; SEMICONDUCTOR MATERIALS; SIMULATED ANNEALING; SURFACE TREATMENT; TUNING; WAVEFORM ANALYSIS;

ACTIVE COMPENSATION; DIFFERENTIAL EVOLUTION; LANGMUIR PROBES; RF PLASMA; SELF ORGANIZING MIGRATION ALGORITHM;

ALGORITHMS;

EID: 21244475901     PISSN: 09659978     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.advengsoft.2005.03.012     Document Type: Article

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