In situ deposition of MgB2 thin films by magnetron cosputtering and sputtering combined with thermal evaporation

Physica C: Superconductivity and its Applications

Volumn 423, Issue 3-4, 2005, Pages 89-95

  Schneider, R ^a   Geerk, J ^a   Linker, G ^a   Ratzel, F ^a   Zaitsev, A G ^a   Obst, B ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

MgB2; Superconducting films; Transport properties

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); EVAPORATION; FILM GROWTH; MAGNESIUM COMPOUNDS; MAGNETRON SPUTTERING; SUPERCONDUCTING TRANSITION TEMPERATURE; SYNTHESIS (CHEMICAL); TRANSPORT PROPERTIES;

FILM DEPOSITION; MAGNETRON COSPUTTERING; RESIDUAL RESISTIVITY RATIO (RRR); THERMAL EVAPORATION;

SUPERCONDUCTING FILMS;

EID: 21144433998     PISSN: 09214534     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physc.2005.04.004     Document Type: Article

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