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Volumn 86, Issue 20, 2005, Pages 1-3
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Instability measurements in amorphous hydrogenated silicon using capacitance-voltage techniques
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Author keywords
[No Author keywords available]
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Indexed keywords
CURRENT VOLTAGE CHARACTERISTICS;
LIQUID CRYSTALS;
METAL INSULATOR TRANSITION;
OHMIC CONTACTS;
PHASE SEPARATION;
THIN FILMS;
THRESHOLD VOLTAGE;
ACTIVE LAYERS;
CHARGE INJECTION;
INSTABILITY MEASUREMENTS;
METAL-INSULATOR-SEMICONDUCTORS (MIS);
SILICON;
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EID: 20844460971
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1928315 Document Type: Article |
Times cited : (7)
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References (7)
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