SIMS analysis of ultrathin implanted arsenic layers in silicon

Technical Physics Letters

Volumn 30, Issue 11, 2004, Pages 897-899

  Kibalov, D S ^a   Orlov, O M ^a   Simakin, S G ^a   Smirnov, V K ^a  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 20444447465     PISSN: 10637850     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1829135     Document Type: Article

References (5)

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3. K. Wittmaack, J. Vac. Sci. Technol. B 16, 2776 (1998).
4. G. A. Sai-Halasz, K. T. Short, and J. S. Williams, IEEE Electron Device Lett. 6, 285 (1985).
5. M. G. Dowsett, G. Rowlands, P. N. Allen, et al., Surf. Interface Anal. 21, 310 (1994).