Modified gaseous electronics conference reference cell for the study of plasma-surface-gas interactions

Review of Scientific Instruments

Volumn 75, Issue 4, 2004, Pages 884-890

  Goeckner, M J ^a   Marquis, J M ^a,b   Markham, B J ^a,c   Jindal, A K ^a   Joseph, E A ^a   Zhou, B S ^a  

^a The University of Texas at Dallas   (United States)

^b IntelliEPI   (United States)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; COATING TECHNIQUES; COOLING; GASES; HEATING; INDUCTIVELY COUPLED PLASMA; PLASMA THEORY; SURFACE CHEMISTRY;

FLEXIBILITY; GASEOUS ELECTRONICS; PLASMA SCIENCES; PLASMA-SURFACE-GAS INTERACTIONS;

BEAM PLASMA INTERACTIONS;

EID: 2042542806     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1688443     Document Type: Article

References (21)

1. Michael A. Lieberman and Allan J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley-Interscience, New York, 1994).
2. M. J. Goeckner, J. Goree, and T. E. Sheridan, J. Vac. Sci. Technol. A 8, 3920 (1990).
3. S. M. Rossnagel, IBM J. Res. Dev. 43, 163 (1999).
4. S. M. Malik, K. Sridharan, R. P. Fetherston, A. Chen, and J. R. Conrad, J. Vac. Sci. Technol. B 12, 483 (1994).
5. S. B. Felch, Z. Fang, B. W. Koo, R. B. Liebert, S. R. Walther, and D. Hacker, Surf. Coat. Technol. 156, 229 (2002).
6. M. J. Goeckner, S. B. Felch, Z. Fang, D. Lenoble, J. Galvier, A. Grouillet, G. C. F. Yeap, D. Bang, and M. R. Lin, J. Vac. Sci. Technol. B 17, 2290 (1999).
7. G. G. Lister, J. J. Curry, and J. E. Lawler, Phys. Rev. E 62, 5576 (2000).
8. G. Earle (private communication).
9. Plasma Etching an Introduction, edited by D. M. Manos and D. L. Flamm (Academic, New York, 1988).
10. Plasma Diagnostics, edited by A. Auciello and D. L. Flamm, Vol. 1 (Academic, New York, 1989).
11. Plasma Diagnostics, edited by A. Auciello and D. L. Flamm, Vol. 2 (Academic, New York, 1989).
12. P. J. Hargis, K. E. Greenburg, P. A. Miller, J. B. Gerardo, J. R. Torczynski, M. E. Riley, G. A. Hebner, J. R. Roberts, J. K. Olthoff, J. R. Whetstone, R. J. Van Brunt, M. A. Sobolewski, H. A. Anderson, M. P. Splichal, J. L. Mock, P. Bletzinger, A. Garscaddedn, R. A. Gottscho, G. Selwyn, M. Dalvie, J. E. Heidenreich, J. W. Butterworth, M. L. Brake, M. L. Passow, J. Pender, A. Lujan, M. E. Elta, D. B. Graves, H. H. Sawin, M. J. Kushner, J. T. Verdeyen, R. Horwath, and T. R. Turner, Rev. Sci. Instrum. 65, 140 (1994).
13. P. A. Miller, G. A. Hebner, K. E. Greenburg, P. D. Pochan, and B. P. Aragon, J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995).
14. L. Tonks and I. Langmuir, Phys. Rev. 33, 195 (1929).
15. M. Schaepkens, R. C. M. Bosch, T. E. F. M. Standaert, G. S. Oehrlein, and J. M. Cook, J. Vac. Sci. Technol. A 16, 2099 (1998).
16. J. R. Creighton and J. E. Parmeter, Crit. Rev. Solid State Mater. Sci. 18, 175 (1993).
17. CRC Handbook of Chemistry and Physics, 60th ed., edited by R. C. Weast and M. J. Astle (CRC, Boca Raton, FL, 1979).
18. D. Halliday, R. Resnick, and J. Walker, Fundamentals of Physics, 5th ed. (Wiley, New York, 1997).
19. W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, Numerical Recipes (Cambridge University, New York, 1986), pp. 547-554.
20. Alan J. Chapman, in Encyclopedia of Physics, 2nd ed., edited by R. G. Lerner and G. L. Trigg (VCH, New York, 1991), pp. 481-484.
21. M. B. Hopkins, J. Res. Natl. Inst. Stand. Technol. 100, 415 (1995).