Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL™ technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5645, Issue , 2005, Pages 114-121

  Lee, Booky ^a   Hung, Richard ^b   Lin, Orson ^a   Wu, Yuan Hsun ^b   Kozuma, Makoto ^a   Shih, Chiang Lin ^b   Hsu, Michael ^c   Hsu, Stephen D ^c  

^a Toppan Chunghwa Electronics Co Ltd   (Taiwan)

^b NANYA TECHNOLOGY CORPORATION   (Taiwan)

^c ASML US Inc   (United States)

Author keywords

Alignment; Alignment mark; Chromeless PSM; CPL ; E beam 2nd writing; Phase shifting mask; PSM

Indexed keywords

ALIGNMENT; COATINGS; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; ETCHING; FUNCTIONS; LIGHT TRANSMISSION; MASKS; OPTIMIZATION; PHASE SHIFT; SCANNING ELECTRON MICROSCOPY;

ALIGNMENT MARK; CHROMELESS PSM; CPL™; E-BEAM 2ND WRITING; PHASE SHIFTING MASKS; PSM;

PHOTOLITHOGRAPHY;

EID: 20044366225     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.576542     Document Type: Conference Paper

References (2)

1. Chun-hung Lin et. al., "Investigation of Phase Variation Impact on CPL PSM for Low K1 Imaging" SPIE Vol. 5130
2. Stephen D. Hsu et. al., "Low K1 Lithography Patterning Options for the 90nm and 65nm Nodes" SPIE Vol. 5130