Characterization of rf sputtered TiOySz thin films

Thin Solid Films

Volumn 484, Issue 1-2, 2005, Pages 113-123

  Lindic, Marie Hélène ^a   Pecquenard, Brigitte ^a   Vinatier, Philippe ^a   Levasseur, Alain ^a   Martinez, Hervé ^b   Gonbeau, Danielle ^b   Petit, Pierre Emmanuel ^c   Ouvrard, Guy ^c  

^a Ecole Nationale Superieure de Chimie et de Physique de Bordeaux   (France)

^b UNIVERSITÉ DE PAU ET DES PAYS DE L'ADOUR   (France)

^c INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

Lithium microbatteries; Sputtering; Thin films; Titanium oxysulfides

Indexed keywords

ABSORPTION SPECTROSCOPY; COMPOSITION; LITHIUM BATTERIES; MORPHOLOGY; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

LITHIUM MICROBATTERIES; MICRODOMAINS; SPUTTERING CONDITIONS; TITANIUM OXYSULFIDES;

TITANIUM OXIDES;

EID: 19944378463     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.02.014     Document Type: Article

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