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Volumn 15, Issue 10, 2004, Pages

Photoluminescence of Yb3+/Er3+ co-doped Al2O3 film fabricated by medium frequency sputter

Author keywords

Anneal; Medium frequency sputter; Photoluminescence; Yb3+ Er3+ co doped

Indexed keywords

ALUMINA; ANNEALING; ERBIUM; MAGNETRON SPUTTERING; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SURFACE TOPOGRAPHY; YTTERBIUM;

EID: 19944366921     PISSN: 10050086     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (7)

References (12)
  • 1
    • 0030126356 scopus 로고    scopus 로고
    • 3 waveguides on silicon
    • 3 waveguides on silicon[J]. Appl Phys Lett., 1996, 68(14): 1886-1888.
    • (1996) Appl Phys Lett. , vol.68 , Issue.14 , pp. 1886-1888
    • van den Hoven, G.N.1
  • 2
    • 0001432302 scopus 로고
    • Photoluminescence characterization of Er-implanted films
    • Van den Hoven G N, et al. Photoluminescence characterization of Er-implanted films[J]. Appl Phys Lett., 1993, 62(24): 3065-3067.
    • (1993) Appl Phys Lett. , vol.62 , Issue.24 , pp. 3065-3067
    • van den Hoven, G.N.1
  • 3
    • 0035890757 scopus 로고    scopus 로고
    • 3 thin films with large erbium concentrations
    • 3 thin films with large erbium concentrations[J]. J Appl Phys Lett., 2001, 90: 5120-5125.
    • (2001) J Appl Phys Lett. , vol.90 , pp. 5120-5125
    • Sema, R.1
  • 4
    • 0031996553 scopus 로고    scopus 로고
    • 3 thin films by plasma-enhanced chemical vapor deposition exhibiting a 55 nm optical bandwidth
    • 3 thin films by plasma-enhanced chemical vapor deposition exhibiting a 55 nm optical bandwidth[J]. IEEE Journal of Quantum Electronics, 1998, 34: 282-284.
    • (1998) IEEE Journal of Quantum Electronics , vol.34 , pp. 282-284
    • Chryssou, C.E.1    Pitt, C.W.2
  • 6
    • 0033705512 scopus 로고    scopus 로고
    • 3 planar waveguide fabricated by sol-gel processes
    • 3 planar waveguide fabricated by sol-gel processes[J]. Thin Solid Films, 2000, 370: 243-247.
    • (2000) Thin Solid Films , vol.370 , pp. 243-247
    • Xiang, Q.1
  • 7
    • 11144228007 scopus 로고    scopus 로고
    • Growth and properties of titanium oxide film by medium frequency alternative reactive magnetron sputtering
    • Chinese source
    • Hou Yaqi, Zhuang Daming, Zhang Gong, et al. Growth and properties of titanium oxide film by medium frequency alternative reactive magnetron sputtering[J]. Vacuum Science and Technology, 2001, (6): 457-460. (in Chinese)
    • (2001) Vacuum Science and Technology , Issue.6 , pp. 457-460
    • Hou, Y.1    Zhuang, D.2    Zhang, G.3
  • 8
    • 11144245554 scopus 로고    scopus 로고
    • 2 by medium frequency reactive dual magnetron sputtering
    • Chinese source
    • 2 by medium frequency reactive dual magnetron sputtering[J]. Vacuum, 2003, (1): 17-20. (in Chinese)
    • (2003) Vacuum , Issue.1 , pp. 17-20
    • Zhao, L.1    Liu, X.-Y.2    Xu, S.3
  • 12
    • 0036699203 scopus 로고    scopus 로고
    • Photoluminescence around 1.54 μm wavelength from erbium-doped silicon dependence on annealing temperature
    • Chinese source
    • XU Fei, XIAO Zhi-song, CHENG Guo-an, et al. Photoluminescence around 1.54 μm wavelength from erbium-doped silicon dependence on annealing temperature[J]. Nuclear techniques, 2002, 25(8): 631-636. (in Chinese)
    • (2002) Nuclear Techniques , vol.25 , Issue.8 , pp. 631-636
    • Xu, F.1    Xiao, Z.-S.2    Cheng, G.-A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.