Photo-bleaching of self-trapped holes in SiO2 glass

Journal of Non-Crystalline Solids

Volumn 351, Issue 19-20, 2005, Pages 1569-1572

  Wang, R P ^a,b   Saito, K ^a   Ikushima, A J ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BLEACHING; ELECTRON TRAPS; IRRADIATION; MICROWAVES; MOS DEVICES; PARAMAGNETIC RESONANCE; RELAXATION PROCESSES; SILICA; ULTRAVIOLET RADIATION;

MICROWAVE POWER; PHOTO-INDUCED BLEACHING; SELF-TRAPPED HOLES; SPECTRAL FEATURES;

GLASS;

EID: 19944364893     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.01.079     Document Type: Article

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