DIVAS: An integrated networked system for mask defect dispositioning and defect management

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5043, Issue , 2003, Pages 114-122

  Munir, Saghir ^a   Bald, Dan ^a   Tolani, Vikram ^a   Ghadiali, Firoz ^a  

^a INTEL CORPORATION   (United States)

Author keywords

Automated dispositioning; Callas; Defect management; DIVAS; Primadonna; Simulation

Indexed keywords

DATABASE SYSTEMS; DEFECTS; MASKS; PRODUCTION CONTROL; QUALITY CONTROL; SILICON WAFERS;

DEFECT INSPECTION VIEWING ARCHING AND SIMULATION; DEFECT MANAGEMENT; MASK DEFECT;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0345303749     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.487634     Document Type: Conference Paper

References (4)

1. Bald, D., Munir, S., Lieberman, B., Howard, W. and Mack, C., "PRIMADONNA: A System for Automated Defect Dispositioning of Production Masks Using Wafer Lithography Simulation," Bacus Conference, Monterey, CA, 2002.
2. Intel Corp, "Intel Image Processing Library", Reference Manual, Intel Corporation, Santa Clara, CA, 1997-2000.
3. Schreiner, D., "OpenGL Reference Manual", Version 1.2, 3rd Edition, Addison Wesley, 1999.
4. Woo, M., Neider, J., Davis, T. and Shreiner, D., "OpenGL Programming Guide", Version 1.2, 3rd Edition, Addison Wesley, 1999.