Fully automated inline sputtering for optical coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 414-422

  List, Matthias ^a   Melde, Christian ^a   Strümpfel, Johannes ^a   Illgen, Claus ^b  

^a VON ARDENNE Anlagentechnik Gm   (Germany)

^b Berliner Glas KGaA   (Germany)

Author keywords

Nb2O5; Optical coatings; Pulsed magnetron sputtering; SiO2

Indexed keywords

ALUMINA; COMPUTER SIMULATION; COMPUTER SOFTWARE; DEPOSITION; GLASS; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; MULTILAYERS; NIOBIUM COMPOUNDS; REFRACTIVE INDEX; SILICA;

NB2O5; PULSED MAGNETRON SPUTTERING; SIO2;

OPTICAL COATINGS;

EID: 1942521715     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.512944     Document Type: Conference Paper

References (6)

1. G. Bräuer, Large Area Deposition, Optical Interference Coatings, Springer Berlin, 2003
2. J. Szczyrbowski et al., Reactive sputtering of dielectric layer on large scale substrates using an AC twin magnetron cathode, Surface and Coating Technologies 93 (1997) 14-20
3. S. Schiller et al., Pulsed magnetron sputter technology, Surface and Coating Technologies, 61 (1993), 331-337
4. S. Schiller et al., The optical plasma emission - a useful tool to monitor the reactive magnetron sputtering, Paper presented on the conference in situ Monitoring and diagnostics of plasma processes
5. J. Strümpfel et al., Reactive dual magnetron sputtering for oxides for large area production of optical multilayers, Proceeding of the Technical Conference of the Society of Vacuum Coaters, New Orleans, 1997
6. K. Starke et al., Rapid prototyping of optical thin film filters, Laser Zentrum Hannover