Development of Dielectric and Amorphous Silicon-Based Thin Film Coatings for Room and Cryogenic Temperature Applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 471-482

  Poirier, M ^a   Ilias, S ^a   Thibault, S ^a   Topart, P ^a   Jerominek, H ^a  

^a INO   (Canada)

Author keywords

Amorphous Silicon; Cryogenic; Dielectric; IAD; Interference filters; RLVIP

Indexed keywords

AMORPHOUS SILICON; BANDPASS FILTERS; CRYOGENICS; DEPOSITION; DIELECTRIC FILMS; DIMENSIONAL STABILITY; ELECTRIC PROPERTIES; OPTICAL PROPERTIES; PLATING; THIN FILMS;

INTERFERENCE FILTERS; ION-ASSISTED DEPOSITION (IAD); REACTIVE LOW VOLTAGE ION PLATING (RLVIP);

COATINGS;

EID: 1942521695     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.513560     Document Type: Conference Paper

References (17)

1. S. Thibault, M. Wang, "Fast camera objective designs for spectrograph of Mont Megantique telescope (Invited Paper)", submitted to Optical System Design 2003, Paper no [5249-12], 2003.
2. D. L. Stierwalt, "Measurement and characterization of IR thin film bandpass filters", Proceeding of Infrared thin films, SPIE Critical Review CR39, pp. 181-195, 1992.
3. M. J. A. De Dood, A. Polman, T. Zijlstra, E. W. J. M. Van Der Drift, "Amorphous silicon waveguides for microphotonics' J. of Applied Physics, 92, pp 649-653, 2002.
4. S. A. Kumar, C. L. Nagendra, H. G. Shanbhogue, G. K. M. Thutupalli, "Near-infraded bandpass filters from Si/SiO2 myultilayer coatings", Optical Engineering, 38, pp. 368-380, 1999.
5. J. Stone, L W Stulz, "Reflectance, transmittance, and loss spectra of multilayer Si/SiO2 thin film mirrors and antireflection coatings for 1.5 μm", Applied Optics, 29, pp. 583-588, 1990.
6. H. K. Pulker, Coating on glass, second and revised edition, Chapter 6, Elsevier, New York, 1999.
7. K. H. Guenther, B. Loo, D. Burns, J. Edgell, D. Winham, K.-H. Müller, "Microstructure analysis of thin film deposited by reactive evaporation and by reactive ion plating", J. of Vacuum Science and Technology A, 7, pp. 1436-1445, 1989.
8. H. K. Pulker, M. Bühler, R. Hora, "Optical films deposited by reactive ion plating process", Proceeding of Optical thin films II : New Developments, SPIE 678, pp. 110-114, 1986.
9. P. Baumeister, "Design and construction of bandbass filters for Wavelength division multiplexing WDM", short course No 105 presented at Optical interference Coatings, Banff, 2001.
10. F. R. Flory, Thin films for optical systems, Chapter 14, pp. 430-437, Marcel Dekker inc., New York, 1995.
11. E. Drouard, P. Huguet-Chantôme, L. Escoubas, F. Flory, "dn/dt Measurements performed with guided waves and their application to the temperature sensitivity of wavelength-division multiplexinf filters", Applied Optics, 41, pp 3132-3136, 2002.
12. P. R. Yoder, Opto-mechanical systems design, Chapter 3, pp. 106-113, Marcel Dekker inc., New York, 1993, 1993.
13. J. W. Berthold III, S.F. Jacobs, "Ultraprecise thermal expansion measurements of seven low expansion materials", Applied Optics, 15, pp. 2344-2347, 1976.
14. S.F. Jacobs, S. C. Johnson, D. E. Schwab, "Dimensional instability of invars", Applied Optics, 23, pp 3500-3502, 1984.
15. H. Takashashi, "Temperature stability of thin film narrow-bandpass filters produced by ion assisted deposition", Applied Optics, 34, pp. 667-675, 1995.
16. H. Pulker, "Density related properties of Metal Oxide films", December 2002, pp. 14-15, Umicore Materials magazine, Switzerland, 2002
17. P. j. Martin, R. P. Netterfield, W. G. Sainty, D. R. Mckenzie, "Optical properties of thin amorphous silicon and amorphous hydrogenated silicon films produced by ion beam techniques", Thin Solid Films, 100, pp. 141-147, 1983.