Ultrahard diamond single crystals from chemical vapor deposition

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 4, 2004, Pages

  Yan, Chih Shiue ^a   Mao, Ho Kwang ^a   Li, Wei ^b   Qian, Jiang ^c   Zhao, Yusheng ^c   Hemley, Russell J ^a  

^a GEOPHYSICAL LABORATORY   (United States)

^b Phoenix Crystal Corporation   (United States)

^c LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRACKS; DIAMONDS; FRACTURE TOUGHNESS; HARDNESS; HIGH PRESSURE EFFECTS; MICROWAVES; PLASMAS;

INTRINSIC HARDNESS; ULTRAHARD DIAMOND SINGLE CRYSTALS;

SINGLE CRYSTALS;

EID: 1942475123     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200409033     Document Type: Article

References (10)

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