Femtosecond pulse laser ablation of sapphire in ambient air

Applied Surface Science

Volumn 228, Issue 1-4, 2004, Pages 221-226

  Wang, X C ^a   Lim, G C ^a   Zheng, H Y ^a   Ng, F L ^a   Liu, W ^b   Chua, S J ^b  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

Damage threshold; Femtosecond pulse laser ablation; Incubation effect; Sapphire; Self focusing

Indexed keywords

COMPOSITE MICROMECHANICS; ETCHING; LASER ABLATION; LASER DAMAGE; MICROMACHINING; MOLECULAR ORIENTATION; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

DAMAGE THRESHOLD; FEMTOSECOND PULSE LASER ABLATION; INCUBATION EFFECT; SELF-FOCUSING;

SURFACE CHEMISTRY;

EID: 1942468800     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.01.009     Document Type: Article

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