A Comparison of Uranium Oxide and Nickel as Single-layer Reflectors from 2.7 to 11.6 Nanometers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5193, Issue , 2004, Pages 191-203

  Sandberg, Richard L ^a   Allred, David D ^a   Johnson, Jed E ^a   Turley, R Steven ^a  

^a Brigham Young University   (United States)

Author keywords

EUV; EUV soft X ray astronomy; Low angle reflector; Nickel; Soft x ray; Synchrotron; Uranium oxide

Indexed keywords

ASTRONOMY; EVAPORATION; MAGNETRONS; MATHEMATICAL MODELS; MIRRORS; NICKEL; REFLECTION; REFRACTIVE INDEX; THIN FILMS; X RAYS;

EUV; LOW-ANGLE REFLECTORS; SOFT X-RAYS;

URANIUM COMPOUNDS;

EID: 1942453812     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.523478     Document Type: Conference Paper

References (22)

1. David D. Allred, Matthew B. Squires, R. Steven Turley, Webster Cash, and Ann Shipley, "Highly Reflective Uranium Mirrors for Astrophysics Applications," in X-ray Mirrors, Crystals and Multilayers, Andreas K. Freund, Albert T. Macrander, Tetsuya Ishikawa, and James. T. Wood, Editors, Proc. SPIE 4782, pp. 212-223, SPIE, Bellingham, WA, 2002.
2. Webster Cash, Private Communication.
3. See, for example, a. D.D. Allred, R. S. Turley, and M. B. Squires, "Dual-function EUV multilayer mirrors for the IMAGE mission," in EUV, X-Ray and Neutron Optics, Carolyn A. Macdonald, Kenneth A. Goldberg, Juan R. Maldonado, H. Heather Chen-Mayer, and Stephen P. Vernon, Editors, Proceedings of SPIE 3767, pp.280-287, SPIE, Bellingham, WA, 1999. b. Matthew B. Squires. The EUV Optical Constants of Sputtered U and a-Si, Honors Thesis, Brigham Young University, Provo, UT, April 1999. http://volta.byu.edu
4. See, for example, a. D.D. Allred, R. S. Turley, and M. B. Squires, "Dual-function EUV multilayer mirrors for the IMAGE mission," in EUV, X-Ray and Neutron Optics, Carolyn A. Macdonald, Kenneth A. Goldberg, Juan R. Maldonado, H. Heather Chen-Mayer, and Stephen P. Vernon, Editors, Proceedings of SPIE 3767, pp.280-287, SPIE, Bellingham, WA, 1999. b. Matthew B. Squires. The EUV Optical Constants of Sputtered U and a-Si, Honors Thesis, Brigham Young University, Provo, UT, April 1999. http://volta.byu.edu
5. Hans Pew, Private Communication.
6. B. R. Sandel, A. L. Broadfoot, J. Chen, C. C. Curtis, R. A. King, T. C. Stone, R. H. Hill, J. Chen, O. H. W. Sigmund, R. Raffanti, David D. Allred, R. Steven Turley, D. L. Gallagher, "The Extreme Ultraviolet Imager Investigation for the IMAGE Mission," Space Science Reviews 91, pp. 197-242 (2000).
7. David Oliphant (oliphantd@byui.edu), Characterization of Uranium, Uranium Oxide and Silicon Multilayer Films, Masters thesis, Dept. of Physics and Astronomy, BYU, Provo, UT 2000. Contact the BYU HBL library at http://www.lib.byu.edu/hbll/or in partial form at http://www.byui.edu/Ricks/ employee/oliphantd/.
8. The curves for these plots were computed at the CXRO website http://www-cxro.lbl.gov/optical_constants/mirror2.html (June-July, 2003) using the option "thick mirrors", that is, single surface mirrors with zero surface roughness. The refractive indices, which are needed for the calculation, were calculated using the atomic scattering factor model using densities which we supplied the program. We used the CRC Handbook of Chemistry and Physics for densities. That is, there was no effort made to obtain the actual densities of the films. Densities: David R. Lide, Ed., CRC Handbook of Chemistry and Physics, 71st edition, CRC Press. Boca Raton, 1990-91
9. The curves for these plots were computed at the CXRO website http://www-cxro.lbl.gov/optical_constants/mirror2.html (June-July, 2003) using the option "thick mirrors", that is, single surface mirrors with zero surface roughness. The refractive indices, which are needed for the calculation, were calculated using the atomic scattering factor model using densities which we supplied the program. We used the CRC Handbook of Chemistry and Physics for densities. That is, there was no effort made to obtain the actual densities of the films. Densities: David R. Lide, Ed., CRC Handbook of Chemistry and Physics, 71st edition, CRC Press. Boca Raton, 1990-91
10. Shannon Lunt, Determining the Indices of Refraction of Reactively Sputtered Uranium Dioxide Thing Films from 46 to 584 Angstroms, Masters Thesis, Dept. of Physics and Astronomy, BYU, Provo, UT 2002. Contact the BYU HBL library at http://www.lib.byu.edu/hbll/
11. G.B Thompson and D.D. Allred, "Reactive Gas Magnetron Sputtering of Lithium Hydride and Lithium Fluoride Thin Films," J.X-ray Sci. Technol. 7, pp. 157-170, 1997.
12. David R. Lide, Ed., CRC Handbook of Chemistry and Physics, 71st edition, p. 10-256, CRC Press, Boca Raton, 1990-91.
13. Kristi R. Adamson, to be published in Utah Academy of Arts and Sciences.
14. Hollilyn Drury and Megan Rowberry, May 2003 International Science Fair, Columbus OH, USA.
15. Program for EUV and X-ray reflectance calculations, courtesy of Prof. David L. Windt: windt@astro.columbia.edu. http://cletus.phys.columbia.edu/windt/ idl.
16. J.H. Underwood et al. "Calibration and standards Beamline 6.3.2 at the Advanced Light Source." Rev. Sci. Instrum., 67 (9), 1-5 (1996).
17. for additional questions.
18. CXRO webpage (July, 2003). http://www-cxro.lbl.gov/optical_constants/ intro.html.
19. B.L. Henke, E.M. Gullikson, and J.C. Davis, X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=7-92, Atomic Data and Nuclear Data Tables 54 no.2, 181-342 (July 1993).
20. A thorough investigation of this carbon contamination and methods for preventing and cleaning contamination will be submitted soon in the Journal of Vacuum Science and Technology.
21. B. W. Veal and D. J. Lam, "X-ray photoelectron studies of thorium, uranium, and their dioxides." Physical Review B, 10 (12), 9028 (1974).
22. R. J. Thorn, "Intensities and Satellites of 4f-photoelectrons in Thorium and Uranium Dioxides." J. Phys. Chem. Solids, 43 (6), 571-5 (1982).