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Volumn 188, Issue 1, 2001, Pages 463-466
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Characterization of AlN/SiC Epitaxial Wafers Fabricated by Hydride Vapour Phase Epitaxy
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 1942446317
PISSN: 00318965
EISSN: None
Source Type: Journal
DOI: 10.1002/1521-396X(200111)188:1<463::AID-PSSA463>3.0.CO;2-H Document Type: Article |
Times cited : (28)
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References (14)
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