Evaluation of Crystal Orientation Dependence of Surface Energy in Silicon

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 68, Issue 2, 2004, Pages 86-89

  Mizuguchi, Takashi ^a   Ikeda, Ken Ichi ^a   Yoshida, Fuyuki ^a   Nakashima, Hideharu ^a   Abe, Hiroshi ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Cleavage plane; Crystal orientation dependence; Molecular dynamics; Reconstruction; Silicon; Surface energy

Indexed keywords

ANNEALING; BRITTLENESS; CRYSTAL ORIENTATION; DUCTILITY; FRACTURE; INTERFACIAL ENERGY; MOLECULAR DYNAMICS; SEMICONDUCTOR DEVICES;

CLEAVAGE PLANE; CRYSTAL ORIENTATION DEPENDENCE; RECONSTRACTION;

SILICON;

EID: 1942443927     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet.68.86     Document Type: Article

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