VO2-based infrared microbolometer array

International Journal of Infrared and Millimeter Waves

Volumn 23, Issue 12, 2002, Pages 1699-1704

  Yi, Xinjian ^a   Chen, Sihai ^a   Wang, Yingrui ^b   Xiong, Bifeng ^a   Wang, Hongchen ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b 25th Research Institute   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; INFRARED DEVICES; ION BEAMS; OXIDATION; RELIABILITY; SILICON; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; VANADIUM COMPOUNDS;

ION MILLING; MICROBOLOMETER ARRAYS; OPTICALLY ACITVE LAYERS; PIXELS;

BOLOMETERS;

EID: 1942443103     PISSN: 01959271     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021450317818     Document Type: Article

References (9)

1. R. A. Wood and N. A. Foss, "Micromachined bolometer arrays achieve low-cost imaging", Laser Focus World, 29(6), (1996)101-106.
2. J. R. McCoy, "Dual-use technologies enhance commercial IR cameras", Laser Focus World, 31(7), (1995) 67-71.
3. R. J. Herring and P. E. Howard, "Design and performance of the ULTRA 320×240 uncooled focal plane and sensor", Proc. SPIE, Vol. 2746 (1996) 2-12.
4. R. A. Wood, "Uncooled thermal imaging with monolithic silicon focal planes", Proc. SPIE, Vol. 2020 (1993) 322-329.
5. Xinjian Yi, Changhong Chen, Lugin Liu, Yingrui Wang, Bifeng Xiong, Hongchen Wang, and Sihai Chen, "A new fabrication method for vanadium dioxide thin films deposited by ion beam sputtering" (To be published in Infrared Physics and Technology).
6. H. Jerominek, F. Picard and D. Vincent, "Vanadium oxide films for optical switching", Optical Engineering, 32 (1993) 2092-2099.
7. C. C. H. Hale, J. S. Barr, H. Gordon et al, "Deposition and Characterization of sputtered vavadium dioxide films", Proc. SPIE, 1270 (1990) 222-236.
8. x thin films", Infrared Physics and Technology, 42 (2001) 87-90.
9. F. Grum and R. J. Becherer, Optical Radiation Measurement, Artech House, Boston, 1994.