Direct observation of thermal alteration of mixed film of Ge and SiO

Thin Solid Films

Volumn 483, Issue 1-2, 2005, Pages 396-399

  Kaito, C ^a   Kamitsuji, K ^a   Tanaka, S ^a   Kido, O ^a   Kurumada, M ^a   Sato, T ^a   Kimura, Y ^b   Suzuki, H ^a   Saito, Y ^c  

^a RITSUMEIKAN UNIVERSITY   (Japan)

^b NASA GODDARD SPACE FLIGHT CENTER   (United States)

^c KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Germanium; Nanostructures; Silicon oxide; Transmission electron microscopy (TEM)

Indexed keywords

CRYSTAL GROWTH; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; GERMANIUM; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; PHASE TRANSITIONS; QUARTZ; SILICA; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

COEVAPORATION; LIQUIDLIKE PHASE; RANDOM BONDING MODEL; SIGE NANOCRYSTALS;

THIN FILMS;

EID: 18844456622     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.12.039     Document Type: Article

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