Low-resistive and transparent AZO films prepared by PLD in magnetic field

Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi)

Volumn 151, Issue 2, 2005, Pages 40-45

  Agura, Hideaki ^a   Okinaka, Hirokazu ^a   Hoki, Shigeyasu ^a   Aoki, Takanori ^a   Suzuki, Akio ^a   Matsushita, Tatsuhiko ^a   Okuda, Masahiro ^b  

^a OSAKA SANGYO UNIVERSITY   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Magnetic field; Pulsed laser deposition method; Transparent conducting aluminum zinc oxide

Indexed keywords

LIQUID CRYSTAL DISPLAYS; MAGNETIC FIELD EFFECTS; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DEPOSITION METHODS; GLASS SUBSTRATES; QUARTZ LENSES; TRANSPARENT CONDUCTING ALUMINUM ZINC OXIDE;

ALUMINUM COMPOUNDS;

EID: 18844443934     PISSN: 04247760     EISSN: None     Source Type: Journal    
DOI: 10.1002/eej.20026     Document Type: Article

References (5)

1. Izumi H, Adurodija FO, Kaneyoshi T, Ishihara T, Yoshioka H, Motoyama M. Electrical and structural properties of indium tin oxide films prepared by pulsed laser deposition. J Appl Phys 2002;91:1213-1218.
2. Suzuki A, Matsushita T, Fukuda T, Fujiwara H, Okuda M. Preparation of transparent conducting ZnO thin films prepared by laser ablation method using split target. IEEJ Trans FM 1997;117-A:405-410. (in Japanese)
3. Pei ZL, Sun C, Tan MH, Xiao JQ, Guan DH, Huang RF, Wen LS. Optical and electrical properties of direct-current magnetron sputtered ZnO:Al films. J Appl Phys 2001;90:3432-3436.
4. Morales-Paliza MA, Haglund RF Jr, Feldman LC. Mechanisms of oxygen incorporation in medium-tin-oxide films deposited by laser ablation at room temperature. Appl Phys Lett 2002;80:3757-3759.
5. Suzuki A, Matsushita T, Aoki T, Yoneyama Y, Okuda M. Pulsed laser deposition of transparent conducting indium tin oxide films in magnetic field perpendicular to plume. Jpn J Appl Phys 2001;40:L401-L403.