Theoretical analysis of vertical colloidal deposition

Journal of Chemical Physics

Volumn 122, Issue 18, 2005, Pages

  Diao, J J ^a   Hutchison, J B ^a   Luo, Guanghong ^a   Reeves, M E ^a,b  

^a GEORGE WASHINGTON UNIVERSITY   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIP COATING METHOD; NANOPARTICLE FILMS; SUBMONOLAYER FILMS; VERTICAL COLLOIDAL DEPOSITION (VCD);

COLLOIDS; DIFFUSION; EVAPORATION; FILM GROWTH; INTERFACES (MATERIALS); MONOLAYERS; NANOSTRUCTURED MATERIALS; SUSPENSIONS (FLUIDS); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DEPOSITION;

EID: 18844374419     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1896352     Document Type: Article

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