Elimination of multimode effects in a silicon-on-insulator etched diffraction grating demultiplexer with Bi-level taper structure

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 11, Issue 2, 2005, Pages 439-443

  Dai, Daoxin ^a,b   He, Jian Jun ^a,b   He, Sailing ^c,d  

^a ZHEJIANG UNIVERSITY   (China)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c Lightip Technologies Inc   (Canada)

^d ZHEJIANG UNIVERSITY   (China)

Author keywords

Air slot; Crosstalk; Etched diffraction grating (EDG); Insertion loss; Multimode effect; Silicon on insulator (SOI); Taper

Indexed keywords

CROSSTALK; DENSE WAVELENGTH DIVISION MULTIPLEXING; DIFFRACTION GRATINGS; ETCHING; INSERTION LOSSES; LIGHT PROPAGATION; OPTICAL COMMUNICATION; SILICON ON INSULATOR TECHNOLOGY;

AIR SLOT; DEMULTIPLEXERS; ETCHED DIFFRACTION GRATING (EDG); MULTIMODE EFFECT; TAPER;

DEMULTIPLEXING;

EID: 18844371558     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSTQE.2005.846543     Document Type: Article

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