Adsorption density of spherical cetyltrimethylammonium bromide (CTAB) micelles at a silica/silicon surface

Applied Spectroscopy

Volumn 59, Issue 5, 2005, Pages 668-672

  Paruchuri, Vamsi K ^a,b   Keqing, F A ^a,d   Moudgil, Brij M ^c   Miller, Jan D ^a  

^a UNIVERSITY OF UTAH   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c University of Florida   (United States)

^d UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Adsorption density; AFM soft contact imaging; Atomic force microscopy; Cetyltrimethylammonium bromide; CTAB; Fourier transform infrared internal reflection spectroscopy; FT IR IRS; Micelle

Indexed keywords

ADSORPTION DENSITY; ATOMIC FORCE MICROSCOPY (AFM) SOFT CONTACT IMAGING; CETYLTRIMETHYLAMMONIUM BROMIDE (CTAB); INTERNAL REFLECTION ELEMENTS (IRE);

ADSORPTION; ATOMIC FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IMAGING TECHNIQUES; MATHEMATICAL MODELS; NUCLEAR MAGNETIC RESONANCE; SILICA; SURFACE ACTIVE AGENTS;

MICELLES;

CETRIMIDE; SILICON; SILICON DIOXIDE; SURFACTANT;

ADSORPTION; ALGORITHM; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; COMPARATIVE STUDY; EVALUATION; INFRARED SPECTROSCOPY; METHODOLOGY; MICELLE; SURFACE PROPERTY; VALIDATION STUDY;

ADSORPTION; ALGORITHMS; CETRIMONIUM COMPOUNDS; MICELLES; MICROSCOPY, ATOMIC FORCE; SILICON; SILICON DIOXIDE; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PROPERTIES; SURFACE-ACTIVE AGENTS;

EID: 18844366163     PISSN: 00037028     EISSN: None     Source Type: Journal    
DOI: 10.1366/0003702053945949     Document Type: Article

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